Design and Implementation of a 2T Gain Cell

Objective

The goal of this project was to design, simulate, and lay out a compact 2-transistor (2T) gain cell using TSMC’s 180nm CMOS technology. The gain cell was intended for integration into an 8×8 dynamic memory array, with a focus on minimizing leakage current and cell area while ensuring stable read and write functionality.

Motivation

As demand grows for low-power and high-density memory in embedded systems, traditional architectures like 6T SRAM and 1T-1C eDRAM present challenges in area and leakage control. The 2T gain cell offers an alternative that eliminates the need for a discrete capacitor and enables area-efficient design using standard CMOS processes. This project aimed to explore the feasibility of the 2T cell for system-on-chip (SoC) integration.

Design and Methodology

Results

Future Work

Tools and Technologies

Faculty Advisor: Prof. Boris Murmann
Department of Electrical Engineering, University of Hawai‘i at Mānoa

Project Paper

Presented Poster