Design and Implementation of a 2T Gain Cell
Objective
The goal of this project was to design, simulate, and lay out a compact 2-transistor (2T) gain cell using TSMC’s 180nm CMOS technology. The gain cell was intended for integration into an 8×8 dynamic memory array, with a focus on minimizing leakage current and cell area while ensuring stable read and write functionality.
Motivation
As demand grows for low-power and high-density memory in embedded systems, traditional architectures like 6T SRAM and 1T-1C eDRAM present challenges in area and leakage control. The 2T gain cell offers an alternative that eliminates the need for a discrete capacitor and enables area-efficient design using standard CMOS processes. This project aimed to explore the feasibility of the 2T cell for system-on-chip (SoC) integration.
Design and Methodology
- Schematic Design: Implemented in Cadence Virtuoso Studio. Transistor sizing was optimized to balance read stability, write access, and data retention.
- Simulation: Performed using ADE Explorer. Transient simulations validated the read/write operation, signal inversion, and storage node behavior.
- Layout Design: Created in Virtuoso Layout Suite XL. Routing used Metal 3 and 4 layers. DRC and LVS checks confirmed physical and functional correctness.
- Array Integration: A 4×4 memory test array was developed to evaluate shared wordline/bitline configuration and array-level read functionality.
Results
- Achieved leakage currents in the range of hundreds of picoamps, consistent with literature.
- Verified functional read/write operation and signal inversion via transient simulation.
- Layout passed all DRC and LVS checks; cell area measured 4.825 µm × 3.091 µm.
- Simulation results from the 4×4 array testbench confirmed correct array behavior.
Future Work
- Complete physical layout and verification of the full 8×8 memory array.
- Incorporate sense amplifiers and decoding logic for robust array operation.
- Prepare for chip tapeout and post-fabrication testing.
- Design Tools: Cadence Virtuoso, ADE Explorer, Layout Suite XL
- Technology: TSMC 180nm CMOS
- Project Type: Senior Capstone (EE 496), University of Hawai‘i at Mānoa
Faculty Advisor: Prof. Boris Murmann
Department of Electrical Engineering, University of Hawai‘i at Mānoa
Project Paper
Presented Poster